Theses most similar to those of author Smith, Taber H. (Taber Hardesty)
Novel techniques for the run by run process control of chemical-mechanical polishing (1996) read it
Variation reduction in plasma etching via run-to-run process control and endpoint detection
Le, Minh Sy (1997)
- Advisor: Herbert H. Sawin
- Department of Electrical Engineering and Computer Science
Device independent process control of dielectric chemical mechanical polishing (1999) read it
Characterization and modeling of polysilicon MEMS chemical-mechanical polishing
Tang, Brian D. (Brian David), 1980- (2004)
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science
Modeling of chemical mechanical polishing using fixed abrasive technology
Dutt, Radhika, 1978- (2000)
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science
Characterization and modeling of pattern dependencies in copper interconnects for integrated circuits
Park, Tae Hong, 1973- (2002)
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science
Chip-scale modeling of pattern dependencies in copper chemical mechanical polishing processes
Gbondo-Tugbawa, Tamba Edward (2002)
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science
Applying run-by-run process control to chemical-mechanical planarization and assessing insertion costs versus benefits of CMP
Altman, Arthur H (1995)
- Advisor: Duane Boning
- Department of Electrical Engineering and Computer Science
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science
Framework for characterization of copper interconnect in damascene CMP processes
Park, Tae Hong, 1973- (1998)
- Advisors: Duane Boning; James Chung
- Department of Electrical Engineering and Computer Science
Assessment of an infrared camera for use as a control sensor for the chemical mechanical planarization process
Nishimoto, Angie Shizue, 1977- (1999)
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science
Characterization and modeling of uniformity in chemical mechanical polishing
Oji, Charles (Charles Ojih), 1974- (1999)
- Advisors: Duane Boning; James Chung
- Department of Electrical Engineering and Computer Science
Modeling of chemical mechanical polishing for shallow trench isolation
Gan, Terence (Terence Chihkiong), 1975- (2000)
- Advisor: Donald S. Boning Duane S. Boning
- Department of Electrical Engineering and Computer Science