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Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes (1995) read it

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  • Department of Electrical Engineering and Computer Science
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  • Department of Electrical Engineering and Computer Science
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  • Department of Electrical Engineering and Computer Science
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  • Department of Electrical Engineering and Computer Science
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  • Department of Electrical Engineering and Computer Science
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  • Department of Electrical Engineering and Computer Science
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  • Department of Electrical Engineering and Computer Science
  • Advisor: Jesús A. del Alamo
  • Department of Electrical Engineering and Computer Science