Theses most similar to Evaluation of unsaturated fluorocarbons for dielectric Etch applications (Chatterjee, Ritwik, 1974-; 2002) read it
Characterization and modeling of plasma etch pattern dependencies in integrated circuits
Abrokwah, Kwaku O (2006)
- Advisor: Donald S. Boning Duane S. Boning
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Non-perfluorocompound chemistries for plasma etching of dielectrics
Tao, Benjamin A. (Benjamin Albert) (1996)
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Alternative chemistries for etching of silicon dioxide and silicon nitride
Karecki, Simon Martin (1996)
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- Department of Electrical Engineering and Computer Science
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Non-perfluorocompound chemistries for dielectric etching applications
Pruette, Laura C. (Laura Catherine), 1974- (1998)
- Advisor: L. Rafael Reif
- Department of Electrical Engineering and Computer Science
- Advisor: Rajeev R. Ram
- Department of Electrical Engineering and Computer Science
A fundamental study of feature evolution during high density plasma etching
Lane, Jennifer M. (Jennifer Marie), 1977- (1999)
- Advisor: Herbert H. Swain
- Department of Electrical Engineering and Computer Science
Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
Labelle, Catherine B., 1972- (1999)
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Oxide etching with NF₃ hydrocarbon chemistries for global warming emissions reduction
Pruette, Laura C. (Laura Catherine), 1974- (2001)
- Advisor: L. Rafael Reif
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Origin, evolution, and control of sidewall line edge roughness transfer during plasma etching
Rasgon, Stacy A., 1974- (2005)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering