Theses most similar to Feature profile evolution during the high density plasma etching of polysilicon (Mahorowala, Arpan P. (Arpan Pravin), 1970-; 1998) read it
A study of plasma etching for use on active metals
Nishimoto, Keane T. (Keane Takeshi), 1981- (2005)
- Advisor: Dr. Jung-Hoon Chun
- Department of Mechanical Engineering
- Advisor: Maria Flytzani-Stephanopoulos
- Department of Chemical Engineering
Electrochemical and photoelectrochemical micromachining of silicon in HF electroytes
Mlcak, Richard (1994)
- Advisor: Harry L. Tuller
- Department of Materials Science and Engineering
An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials
Bai, Bo (2006)
- Advisor: Herbert H. Swain
- Department of Physics
3-dimensional modeling and simulation of surface and sidewall roughening during plasma etching
Kawai, Hiroyo (2008)
- Advisor: Herbert H. Sawin
- Department of Chemical Engineering
Etching kinetics and surface roughening of polysilicon and dielectric materials in inductively coupled plasma beams
Yin, Yunpen (2007)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
A fundamental study of feature evolution during high density plasma etching
Lane, Jennifer M. (Jennifer Marie), 1977- (1999)
- Advisor: Herbert H. Swain
- Department of Electrical Engineering and Computer Science
Fabrication of capacitors based on silicon nanowire arrays generated by metal-assisted wet chemical etching
Zheng, We (2016)
- Advisor: Carl V. Thompson, II
- Department of Materials Science and Engineering
Origin, evolution, and control of sidewall line edge roughness transfer during plasma etching
Rasgon, Stacy A., 1974- (2005)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
Current limiters based on silicon pillar un-gated FET for field emission application
Niu, Yin (2009)
- Advisor: Akintunde Ibitayo (Tayo) Akinwande
- Department of Electrical Engineering and Computer Science