Theses most similar to Alternative chemistries for etching of silicon dioxide and silicon nitride (Karecki, Simon Martin; 1996) read it
Development of novel alternative chemistry processes for dielectric etch applications
Karecki, Simon Martin (2000)
- Advisor: L. Rafael Reif
- Department of Electrical Engineering and Computer Science
An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials
Bai, Bo (2006)
- Advisor: Herbert H. Swain
- Department of Physics
Growth and doping of zinc selenide using alternative gaseous source epitaxial techniques
Ho, Easen (1996)
- Advisor: Leslie A. Kolodziejski
- Department of Electrical Engineering and Computer Science
Non-perfluorocompound chemistries for plasma etching of dielectrics
Tao, Benjamin A. (Benjamin Albert) (1996)
- Advisor: L. Rafael Reif
- Department of Materials Science and Engineering
Growth and optical monitoring of organometallic vapor phase epitaxy
Foley, Lawrence J. (Lawrence Joseph) (1996)
- Advisor: Klavs F. Jensen
- Department of Materials Science and Engineering
- Advisor: Tomás Palacios
- Department of Electrical Engineering and Computer Science
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
Non-perfluorocompound chemistries for dielectric etching applications
Pruette, Laura C. (Laura Catherine), 1974- (1998)
- Advisor: L. Rafael Reif
- Department of Electrical Engineering and Computer Science
Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
Labelle, Catherine B., 1972- (1999)
- Advisor: Karen K. Gleason
- Department of Chemical Engineering
Evaluation of unsaturated fluorocarbons for dielectric Etch applications
Chatterjee, Ritwik, 1974- (2002)
- Advisor: L. Rafael Reif
- Department of Electrical Engineering and Computer Science