Theses most similar to Non-perfluorocompound chemistries for plasma etching of dielectrics (Tao, Benjamin A. (Benjamin Albert); 1996) read it

Development of novel alternative chemistry processes for dielectric etch applications

Karecki, Simon Martin (2000)

  • Advisor: L. Rafael Reif
  • Department of Electrical Engineering and Computer Science
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Sputtered silicon oxynitride for microphotonics : a materials study

Sandland, Jessica Gene, 1977- (2004)

  • Advisor: Lionel C. Kimerling
  • Department of Materials Science and Engineering
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A study of plasma etching for use on active metals

Nishimoto, Keane T. (Keane Takeshi), 1981- (2005)

  • Advisor: Dr. Jung-Hoon Chun
  • Department of Mechanical Engineering
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Electrochemical and photoelectrochemical micromachining of silicon in HF electroytes

Mlcak, Richard (1994)

  • Advisor: Harry L. Tuller
  • Department of Materials Science and Engineering
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Growth and doping of zinc selenide using alternative gaseous source epitaxial techniques

Ho, Easen (1996)

  • Advisor: Leslie A. Kolodziejski
  • Department of Electrical Engineering and Computer Science
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Growth and optical monitoring of organometallic vapor phase epitaxy

Foley, Lawrence J. (Lawrence Joseph) (1996)

  • Advisor: Klavs F. Jensen
  • Department of Materials Science and Engineering
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Alternative chemistries for etching of silicon dioxide and silicon nitride

Karecki, Simon Martin (1996)

  • Advisor: L. Rafael Reif
  • Department of Electrical Engineering and Computer Science
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Non-perfluorocompound chemistries for dielectric etching applications

Pruette, Laura C. (Laura Catherine), 1974- (1998)

  • Advisor: L. Rafael Reif
  • Department of Electrical Engineering and Computer Science
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Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

Labelle, Catherine B., 1972- (1999)

  • Advisor: Karen K. Gleason
  • Department of Chemical Engineering
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Evaluation of unsaturated fluorocarbons for dielectric Etch applications

Chatterjee, Ritwik, 1974- (2002)

  • Advisor: L. Rafael Reif
  • Department of Electrical Engineering and Computer Science
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