Theses most similar to Etching kinetics and surface roughening of polysilicon and dielectric materials in inductively coupled plasma beams (Yin, Yunpen; 2007) read it
A study of plasma etching for use on active metals
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- Advisor: Dr. Jung-Hoon Chun
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- Department of Chemical Engineering
An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials
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Ross, April Denise, 1977- (2005)
- Advisor: Karen K. Gleason
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Feature profile evolution during the high density plasma etching of polysilicon
Mahorowala, Arpan P. (Arpan Pravin), 1970- (1998)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
- Advisor: Carl V. Thompson, II
- Department of Materials Science and Engineering
- Advisor: Henry I. Smith
- Department of Electrical Engineering and Computer Science
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Bruccoleri, Alexander Robert (2013)
- Advisor: Mark L. Schattenburg
- Department of Aeronautics and Astronautics
Post oxide etching cleaning process using integrated ashing and HF vapor process
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Origin, evolution, and control of sidewall line edge roughness transfer during plasma etching
Rasgon, Stacy A., 1974- (2005)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering