Theses most similar to An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials (Bai, Bo; 2006) read it
A study of plasma etching for use on active metals
Nishimoto, Keane T. (Keane Takeshi), 1981- (2005)
- Advisor: Dr. Jung-Hoon Chun
- Department of Mechanical Engineering
The ion-beam reactive sputtering process for deposition of niobium nitride thin films
Lichtenwalner, Daniel Jenner (1990)
- Advisors: Alfredo C. Anderson; David A. Rudman
- Department of Materials Science and Engineering
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
- Advisor: Leslie A. Kolodziejski
- Department of Electrical Engineering and Computer Science
Etching kinetics and surface roughening of polysilicon and dielectric materials in inductively coupled plasma beams
Yin, Yunpen (2007)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterened polysilicon
Chang, Jane Pei-chen, 1967- (1998)
- Advisor: Herbert H. Sawin
- Department of Chemical Engineering
Feature profile evolution during the high density plasma etching of polysilicon
Mahorowala, Arpan P. (Arpan Pravin), 1970- (1998)
- Advisor: Herbert H. Swain
- Department of Chemical Engineering
Post oxide etching cleaning process using integrated ashing and HF vapor process
Kwon, Ohseung, 1969- (1999)
- Advisor: Herbert H. Swain
- Department of Materials Science and Engineering
- Advisor: Leslie A. Kolodziejski
- Department of Electrical Engineering and Computer Science
Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors
Bae, Dohyun (2015)
- Advisor: Jurgen Michel
- Department of Materials Science and Engineering